Abstract |
We report how a low vacuum pressure process followed by a few-minute annealing enables epitaxial stabilization, producing high-quality, phase-pure, single-crystalline epitaxial, and misfit dislocation-free BiFeO3(001) thin films on SrTiO3(001) at ∼450 °C less than current routes. These results unambiguously challenge the widely held notion that atomic layer deposition (ALD) is not appropriate for attaining high-quality chemically complex oxide films on perovskite substrates in single-crystalline epitaxial form, demonstrating applicability as an inexpensive, facile, and highly scalable route.
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Authors | Andrew R Akbashev, Guannan Chen, Jonathan E Spanier |
Journal | Nano letters
(Nano Lett)
Vol. 14
Issue 1
Pg. 44-9
(Jan 08 2014)
ISSN: 1530-6992 [Electronic] United States |
PMID | 24063419
(Publication Type: Journal Article, Research Support, Non-U.S. Gov't, Research Support, U.S. Gov't, Non-P.H.S.)
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