Five cases of photocontact dermatitis due to topical ketoprofen: photopatch testing and cross-reaction study.

Abstract

BACKGROUND:

In parallel with the popular usage of topical ketoprofen, the number of reported cases of ketoprofen-induced photoallergic contact dermatitis has been increasing. It is clinically important to know the cross-reactivity of ketoprofen in order to avoid cross-sensitization caused by several structurally similar non-steroidal anti-inflammatory drugs (NSAID) on the market.

METHODS:

To evaluate the spectrum of cross sensitization, photopatch testing was performed on five patients with ketoprofen-induced photoallergic contact dermatitis using ketoprofen and other structurally similar chemicals, such as oxybenzone, tiaprofenic acid and suprofen.

RESULTS:

All five patients reacted positively to ketoprofen or ketoprofen plaster on photopatch testing. All four patients photopatch tested with related chemicals showed cross-photosensitization with tiaprofenic acid and suprofen. However, none of the patients reacted positively to oxybenzone.

CONCLUSION:

Either the diphenylketone moiety or a structurally similar tiophene-phenylketone moiety is important as the antigenic determinants of ketoprofen photoallergy. The arylpropionic acid side chain would not be involved.

• Authors: T Matsushita, R Kamide
• Journal: Photodermatology, photoimmunology & photomedicine (Photodermatol Photoimmunol Photomed) Vol. 17 Issue 1 Pg. 26-31 (Feb 2001) ISSN: 0905-4383 [Print] England
• PMID: 11169173 (Publication Type: Journal Article)

Chemical References

• Anti-Inflammatory Agents, Non-Steroidal
• Ketoprofen

Topics

• Adult
• Anti-Inflammatory Agents, Non-Steroidal (adverse effects, chemistry)
• Cross Reactions
• Dermatitis, Photoallergic (diagnosis, etiology)
• Female
• Humans
• Ketoprofen (adverse effects, chemistry)
• Male
• Molecular Structure
• Patch Tests